Issued Patents 2024
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12170218 | Method for cleaning electrostatic chuck | Yueh-Lin Yang | 2024-12-17 |
| 12066756 | Method for lithography process | Yueh-Lin Yang | 2024-08-20 |
| 12048944 | Method of operating drippage prevention system | Chien-Hung Wang, Chun-Chih Lin, Yung-Yao Lee, Wei Chang Cheng | 2024-07-30 |
| 12025922 | Methods and apparatus for reducing hydrogen permeation from lithographic tool | Po-Ming SHIH | 2024-07-02 |
| 12027407 | Substrate support apparatus and method | Yueh-Lin Yang, Fei-Gwo Tsai | 2024-07-02 |
| 12025923 | Lithography system and operation method thereof | Min-Cheng Wu | 2024-07-02 |
| 12017322 | Chemical mechanical polishing method | Wei Chang Cheng | 2024-06-25 |
| 12020963 | Method of performing a substrate detection process | Min-Cheng Wu | 2024-06-25 |
| 12007691 | Substrate measuring device and a method of using the same | Min-Cheng Wu | 2024-06-11 |
| 11988972 | Method and apparatus for improving critical dimension variation | Ming-Hsun LIN, Yu-Hsiang Ho, Jhun Hua Chen, Teng Kuei Chuang | 2024-05-21 |
| 11980920 | Apparatus and methods for exhaust cleaning | Wei Chang Cheng, Cheng-Kuang Chen | 2024-05-14 |
| 11959864 | Photolithography method and photolithography system | Wei Chang Cheng | 2024-04-16 |
| 11940738 | Droplet splash control for extreme ultra violet photolithography | Po-Ming SHIH | 2024-03-26 |
| 11940737 | Method of fabricating reticle | Hsueh-Yi Chung, Yung-Cheng Chen, Fei-Gwo Tsai, Shih-Chi Fu, Wei-Ti Hsu +4 more | 2024-03-26 |
| 11923187 | Cleaning method and apparatus | Min-Cheng Wu | 2024-03-05 |
| 11923231 | Substrate table with vacuum channels grid | Min-Cheng Wu | 2024-03-05 |
| 11914302 | Method and apparatus for controlling droplet in extreme ultraviolet light source | Yueh-Lin Yang | 2024-02-27 |
| 11914288 | Photomask having recessed region | Yu-Yu Chen | 2024-02-27 |
| 11899378 | Lithography system and operation method thereof | Min-Cheng Wu | 2024-02-13 |
| 11899377 | System and method for thermal management of reticle in semiconductor manufacturing | Yueh-Lin Yang | 2024-02-13 |