Issued Patents 2024
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12165928 | Integrated circuits with recessed gate electrodes | Srijit Mukherjee, Christopher J. Wiegand, Tyler J. Weeks, Mark Liu | 2024-12-10 |
| 12142667 | Contact over active gate structures for advanced integrated circuit structure fabrication | Andrew W. Yeoh, Tahir Ghani, Atul MADHAVAN, Christopher P. Auth | 2024-11-12 |
| 12094955 | Confined epitaxial regions for semiconductor devices | Szuya S. Liao, Tahir Ghani | 2024-09-17 |
| 12057492 | Gate cut and fin trim isolation for advanced integrated circuit structure fabrication | Tahir Ghani, Byron Ho, Christopher P. Auth | 2024-08-06 |
| 12016170 | Fin cut and fin trim isolation for advanced integrated circuit structure fabrication | Tahir Ghani, Byron Ho, Curtis W. Ward, Christopher P. Auth | 2024-06-18 |
| 11961838 | Fin end plug structures for advanced integrated circuit structure fabrication | Byron Ho, Chun-Kuo HUANG, Erica J. Thompson, Jeanne Luce, Christopher P. Auth +1 more | 2024-04-16 |
| 11961767 | Dual metal silicide structures for advanced integrated circuit structure fabrication | Jeffrey S. Leib, Srijit Mukherjee, Vinay BHAGWAT, Christopher P. Auth | 2024-04-16 |
| 11955532 | Dual metal gate structure having portions of metal gate layers in contact with a gate dielectric | Jeffrey S. Leib, Jenny Hu, Anindya Dasgupta, Christopher P. Auth | 2024-04-09 |
| 11948997 | Trench contact structures for advanced integrated circuit structure fabrication | Subhash M. Joshi, Jeffrey S. Leib | 2024-04-02 |
| 11887838 | Trench plug hardmask for advanced integrated circuit structure fabrication | Anthony St. Amour, Christopher P. Auth | 2024-01-30 |
| 11881520 | Fin patterning for advanced integrated circuit structure fabrication | Curtis W. Ward, Heidi M. Meyer, Christopher P. Auth | 2024-01-23 |