| 12142667 |
Contact over active gate structures for advanced integrated circuit structure fabrication |
Andrew W. Yeoh, Tahir Ghani, Atul MADHAVAN, Michael L. Hattendorf |
2024-11-12 |
| 12057492 |
Gate cut and fin trim isolation for advanced integrated circuit structure fabrication |
Tahir Ghani, Byron Ho, Michael L. Hattendorf |
2024-08-06 |
| 12016170 |
Fin cut and fin trim isolation for advanced integrated circuit structure fabrication |
Tahir Ghani, Byron Ho, Curtis W. Ward, Michael L. Hattendorf |
2024-06-18 |
| 11961767 |
Dual metal silicide structures for advanced integrated circuit structure fabrication |
Jeffrey S. Leib, Srijit Mukherjee, Vinay BHAGWAT, Michael L. Hattendorf |
2024-04-16 |
| 11961838 |
Fin end plug structures for advanced integrated circuit structure fabrication |
Byron Ho, Chun-Kuo HUANG, Erica J. Thompson, Jeanne Luce, Michael L. Hattendorf +1 more |
2024-04-16 |
| 11955534 |
Heterogeneous metal line compositions for advanced integrated circuit structure fabrication |
Andrew W. Yeoh, Joseph M. Steigerwald, Jinhong SHIN, Vinay Chikarmane |
2024-04-09 |
| 11955532 |
Dual metal gate structure having portions of metal gate layers in contact with a gate dielectric |
Jeffrey S. Leib, Jenny Hu, Anindya Dasgupta, Michael L. Hattendorf |
2024-04-09 |
| 11887838 |
Trench plug hardmask for advanced integrated circuit structure fabrication |
Anthony St. Amour, Michael L. Hattendorf |
2024-01-30 |
| 11881520 |
Fin patterning for advanced integrated circuit structure fabrication |
Curtis W. Ward, Heidi M. Meyer, Michael L. Hattendorf |
2024-01-23 |