Issued Patents 2024
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12051698 | Fabrication of gate-all-around integrated circuit structures having molybdenum nitride metal gates and gate dielectrics with a dipole layer | Daniel G. Ouellette, Daniel B. O'Brien, Orb Acton, Lukas Baumgartel, Dan S. LAVRIC +3 more | 2024-07-30 |
| 11961767 | Dual metal silicide structures for advanced integrated circuit structure fabrication | Srijit Mukherjee, Vinay BHAGWAT, Michael L. Hattendorf, Christopher P. Auth | 2024-04-16 |
| 11955532 | Dual metal gate structure having portions of metal gate layers in contact with a gate dielectric | Jenny Hu, Anindya Dasgupta, Michael L. Hattendorf, Christopher P. Auth | 2024-04-09 |
| 11948997 | Trench contact structures for advanced integrated circuit structure fabrication | Subhash M. Joshi, Michael L. Hattendorf | 2024-04-02 |