Issued Patents 2024
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12183578 | Method for forming and patterning a layer and/or substrate | Takehito Koshizawa, Rui Cheng, Hidetaka Oshio | 2024-12-31 |
| 11994800 | Dose reduction of patterned metal oxide photoresists | Lifan Yan, Abhijit Basu Mallick, Daniel Lee Diehl, Ho-yung David Hwang, Jothilingam Ramalingam | 2024-05-28 |