Issued Patents 2023
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11855188 | Source/drain formation with reduced selective loss defects | Chih-Chiang Chang, Li-Li Su | 2023-12-26 |
| 11830934 | Increasing source/drain dopant concentration to reduced resistance | Yi-Jing Lee | 2023-11-28 |
| 11824120 | Method of fabricating a source/drain recess in a semiconductor device | Eric Peng, Chao-Cheng Chen, Chii-Horng Li, Shih-Hao Lo, Syun-Ming Jang +2 more | 2023-11-21 |
| 11797375 | System for debugging server startup sequence in debugging method applied in server | Xiao Zhou | 2023-10-24 |
| 11769771 | FinFET device having flat-top epitaxial features and method of making the same | Yi-Jing Lee, Li-Wei Chou | 2023-09-26 |
| 11749756 | Method for manufacturing semiconductor device | Che-Yu Lin, Tze-Liang Lee, Chan-Lon Yang | 2023-09-05 |
| 11695063 | Method of forming shaped source/drain epitaxial layers of a semiconductor device | Yi-Jing Lee | 2023-07-04 |
| 11688807 | Semiconductor device and methods of forming | Hung-Tai Chang, Han-Yu Tang, Yee-Chia Yeo | 2023-06-27 |
| 11652105 | Epitaxy regions with large landing areas for contact plugs | Jung-Chi Tai, Yi-Fang Pai, Tsz-Mei Kwok, Tsung-Hsi Yang, Jeng-Wei Yu +5 more | 2023-05-16 |
| 11574916 | Semiconductor device and manufacturing method thereof | Yi-Jing Lee, Tsz-Mei Kwok, Kun-Mu Li | 2023-02-07 |
| 11569084 | Method for manufacturing semiconductor structure with reduced nodule defects | Che-Yu Lin, Chih-Chiang Chang, Chien-Hung Chen, Tsung-Hsi Yang, Ting-Yi HUANG +2 more | 2023-01-31 |