Issued Patents 2023
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE49732 | Charged particle lithography system with alignment sensor and beam measurement sensor | Paul IJmert Scheffers, Jan Andries Meijer, Vincent Sylvester Kuiper, Niels Vergeer | 2023-11-21 |
| RE49602 | Lithography system, sensor and measuring method | Pieter Kruit, Tijs Frans Teepen, Marco Jan-Jaco Wieland, Stijn Willem Herman Karel Steenbrink | 2023-08-08 |