Issued Patents 2023
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE49732 | Charged particle lithography system with alignment sensor and beam measurement sensor | Jan Andries Meijer, Erwin Slot, Vincent Sylvester Kuiper, Niels Vergeer | 2023-11-21 |
| RE49483 | Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus | — | 2023-04-04 |