CH

Christoph Hennerkes

AB Asml Netherlands B.V.: 2 patents #90 of 696Top 15%
📍 Leverkusen, CA: #1 of 3 inventorsTop 35%
Overall (2023): #167,688 of 537,848Top 35%
2
Patents 2023

Issued Patents 2023

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
11733615 Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method Frank Staals 2023-08-22
11586114 Wavefront optimization for tuning scanner based on performance matching Duan-Fu Stephen Hsu, Rafael C. Howell, Zhan Shi, Xiaoyang Li, Frank Staals 2023-02-21