PT

Patricius Aloysius Jacobus Tinnemans

AB Asml Netherlands B.V.: 2 patents #90 of 696Top 15%
📍 Hapert, NL: #1 of 1 inventorsTop 100%
Overall (2023): #119,685 of 537,848Top 25%
2
Patents 2023

Issued Patents 2023

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
11709436 Metrology apparatus and method for determining a characteristic of one or more structures on a substrate Patrick Warnaar, Vasco Tomas Tenner, Maurits Van Der Schaar 2023-07-25
11650047 Metrology apparatus and method for determining a characteristic of one or more structures on a substrate Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Patrick Warnaar, Grzegorz Grzela +1 more 2023-05-16