HK

Hirotomo Kawahara

AG Agc: 2 patents #25 of 253Top 10%
📍 Tokyo, CA: #93 of 251 inventorsTop 40%
Overall (2023): #151,496 of 537,848Top 30%
2
Patents 2023

Issued Patents 2023

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
11822229 Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof Daijiro AKAGI, Toshiyuki Uno, Ichiro Ishikawa, Kenichi Sasaki 2023-11-21
11698580 Reflective mask blank for EUV lithography Hiroyoshi Tanabe, Toshiyuki Uno, Hiroshi Hanekawa, Daijiro AKAGI 2023-07-11