Issued Patents 2022
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11522083 | Fin field-effect transistor device and method of forming the same | Jian-Jou Lian, Chieh-Wei Chen, Tzu-Ang Chiang, Ming-Hsi Yeh | 2022-12-06 |
| 11488857 | Semiconductor device and method of manufacture using a contact etch stop layer (CESL) breakthrough process | Yu-Shih Wang, Po-Nan Yeh, U-Ting Chiu, Chia-Cheng Chen, Liang-Yin Chen +2 more | 2022-11-01 |
| 11424185 | Semiconductor device and manufacturing method thereof | Cheng-Wei Chang, Chia-Hung Chu, Kao-Feng Lin, Hsu-Kai Chang, Shuen-Shin Liang +6 more | 2022-08-23 |
| 11398391 | Substrate processing apparatus and method for processing substrate | Po-Yuan Wang, Tzu-Ang Chiang, Jian-Jou Lian, Yu-Shih Wang, Ming-Hsi Yeh | 2022-07-26 |
| 11380793 | Fin field-effect transistor device having hybrid work function layer stack | Ming-Hsi Yeh, Hung-Chin Chung, Hsin-Yun Hsu | 2022-07-05 |
| 11309190 | Semiconductor device and method of manufacture | Jian-Jou Lian, Chieh-Wei Chen, Tzu-Ang Chiang, Ming-Hsi Yeh | 2022-04-19 |
| 11309185 | Fin field-effect transistor and method of forming the same | Tzu-Ang Chiang, Ming-Hsi Yeh, Jian-Jou Lian, Po-Yuan Wang, Chieh-Wei Chen | 2022-04-19 |
| 11276571 | Method of breaking through etch stop layer | Yu-Shih Wang, Hong-Jie Yang, Chia-Ying Lee, Po-Nan Yeh, U-Ting Chiu +2 more | 2022-03-15 |
| 11227940 | Fin field-effect transistor device and method of forming the same | Jian-Jou Lian, Ming-Hsi Yeh, Chieh-Wei Chen, Tzu-Ang Chiang | 2022-01-18 |