Issued Patents 2022
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11515211 | Cut EPI process and structures | Feng-Ching Chu, Wei-Yang Lee | 2022-11-29 |
| 11489078 | Lightly-doped channel extensions | Wei-Jen Lai, Wei-Yuan Lu, Chih-Hao Yu | 2022-11-01 |
| 11450559 | Integrated circuit structure with backside dielectric layer having air gap | Che-Lun Chang, Wei-Yang Lee, Yuan-Ching Peng | 2022-09-20 |
| 11444178 | Inner spacer liner | Jin-Mu Yin, Wei-Yang Lee, Chih-Hao Yu, Yen-Ting Chen | 2022-09-13 |
| 11417767 | Semiconductor devices including backside vias and methods of forming the same | Che-Lun Chang, Wei-Yang Lee, Yuan-Ching Peng | 2022-08-16 |
| 11374128 | Method and structure for air gap inner spacer in gate-all-around devices | Shih-Chiang Chen, Wei-Yang Lee, Yuan-Ching Peng | 2022-06-28 |
| 11328960 | Semiconductor structure with gate-all-around devices and stacked FinFET devices | Feng-Ching Chu, Wei-Yang Lee | 2022-05-10 |
| 11289584 | Inner spacer features for multi-gate transistors | Bone-Fong Wu, Chih-Hao Yu | 2022-03-29 |