Issued Patents 2022
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11454890 | Composition for resist underlayer film formation, resist underlayer film and forming method thereof, patterned substrate-producing method, and compound | Naoya Nosaka, Yuushi MATSUMURA, Hiroki Nakatsu, Kazunori Takanashi | 2022-09-27 |
| 11243468 | Composition for resist underlayer film formation, resist underlayer film and formation method thereof, and patterned substrate production method | Naoya Nosaka, Goji Wakamatsu, Tsubasa Abe, Ichihiro Miura, Kengo EHARA +1 more | 2022-02-08 |