HN

Hayato Namai

JS Jsr: 1 patents #20 of 106Top 20%
📍 Tokyo, CA: #158 of 264 inventorsTop 60%
Overall (2022): #438,695 of 548,613Top 80%
1
Patents 2022

Issued Patents 2022

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
11320739 Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate Goji Wakamatsu, Naoya Nosaka, Tsubasa Abe, Kazunori Sakai, Yuushi MATSUMURA 2022-05-03