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Multi-metal dipole doping to offer multi-threshold voltage pairs without channel doping for highly scaling CMOS device |
Ruqiang Bao, Terence B. Hook, Hemanth Jagannathan |
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Oxygen-free plasma etching for contact etching of resistive random access memory |
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Artificial synapse with hafnium oxide-based ferroelectric layer in CMOS back-end |
Martin M. Frank, Takashi Ando, Xiao Sun, Jin-Ping Han |
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Encryption engine with an undetectable/tamper-proof private key in late node CMOS technology |
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Device with pure silicon oxide layer on silicon-germanium layer |
Takashi Ando, Pouya Hashemi, Hemanth Jagannathan, Choonghyun Lee |
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