Issued Patents 2022
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11488812 | Method and apparatus for reducing particle defects in plasma etch chambers | Xikun Wang, Andrew Nguyen, Xiaoming He, Meihua Shen | 2022-11-01 |
CL
Changhun Lee
Overall (2022): #498,314 of 548,613Top 95%
1
Patents 2022