Issued Patents 2022
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11428521 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Maurits Van Der Schaar +7 more | 2022-08-30 |
| 11320745 | Measuring a process parameter for a manufacturing process involving lithography | Maurits Van Der Schaar, Arie Jeffrey Den Boef, Te-Chih Huang, Youping Zhang | 2022-05-03 |