Issued Patents 2021
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D934991 | Component of a liquid discharge nozzle for semiconductor substrate processing apparatus | Yoshifumi Amano | 2021-11-02 |
| D930796 | Liquid discharge nozzle for semiconductor substrate processing apparatus | Yoshifumi Amano | 2021-09-14 |
| D929534 | Liquid discharge nozzle for semiconductor substrate processing apparatus | Yoshifumi Amano | 2021-08-31 |
| 11024518 | Substrate processing apparatus, substrate processing method and recording medium | Norihiro Ito, Jiro Higashijima, Nobuhiro Ogata, Takahisa Otsuka, Yuichi Douki +2 more | 2021-06-01 |