EN

Eiichi Nishimura

TL Tokyo Electron Limited: 2 patents #116 of 787Top 15%
📍 Rifu, MA: #1 of 3 inventorsTop 35%
Overall (2021): #164,768 of 548,734Top 35%
2
Patents 2021

Issued Patents 2021

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10975468 Method of cleaning plasma processing apparatus Hiroki Kishi, Mitsuru Hashimoto, Keiichi Shimoda, Akitaka Shimizu 2021-04-13
10923329 Substrate processing apparatus and substrate processing method Akitaka Shimizu, Fumiko Yamashita, Daisuke Urayama 2021-02-16