Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211253 | Atomic layer deposition and etch in a single plasma chamber for critical dimension control | Xiang Zhou, Yoshie Kimura, Duming Zhang, Chen Xu, Ganesh Upadhyaya | 2021-12-28 |
| 11170997 | Atomic layer deposition and etch for reducing roughness | Xiang Zhou, Naveed Ansari, Yoshie Kimura, Si Yi Li, Kazi Sultana +5 more | 2021-11-09 |