Issued Patents 2021
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11036133 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Hiromitsu Nakashima, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2021-06-15 |
| 11003079 | Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound | Naoya Nosaka, Tsubasa Abe, Yuushi MATSUMURA, Masayuki Miyake, Yoshio Takimoto | 2021-05-11 |