Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11126084 | Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound | Naoya Nosaka, Goji Wakamatsu, Yuushi MATSUMURA, Yoshio Takimoto, Shin-ya Nakafuji +1 more | 2021-09-21 |
| 11003079 | Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound | Naoya Nosaka, Gouji Wakamatsu, Yuushi MATSUMURA, Masayuki Miyake, Yoshio Takimoto | 2021-05-11 |