Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11130856 | Resin composition and method of forming resist pattern | Tomohiko SAKURAI, Sosuke Osawa | 2021-09-28 |
| 11036133 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | Hiroki Nakagawa, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya | 2021-06-15 |