Issued Patents 2021
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11156917 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Kyohei Sakita, Mitsuhiro Fujita, Takumi Tanaka, Keishi YAMAMOTO, Keita Kato | 2021-10-26 |
| 11150557 | Pattern forming method, method for manufacturing electronic device, monomer for producing resin for semiconductor device manufacturing process, resin, method for producing resin, actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film | Naoya HATAKEYAMA, Yasunori Yonekuta | 2021-10-19 |
| 11073762 | Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator | Daisuke ASAKAWA, Masafumi KOJIMA, Keita Kato, Keiyu OU, Kyohei Sakita | 2021-07-27 |
| 11067890 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | Masafumi KOJIMA, Akira Takada, Keita Kato, Kyohei Sakita | 2021-07-20 |