NH

Naoya HATAKEYAMA

FU Fujifilm: 2 patents #209 of 731Top 30%
Overall (2021): #127,763 of 548,734Top 25%
2
Patents 2021

Issued Patents 2021

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
11150557 Pattern forming method, method for manufacturing electronic device, monomer for producing resin for semiconductor device manufacturing process, resin, method for producing resin, actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film Akiyoshi GOTO, Yasunori Yonekuta 2021-10-19
10923769 Electrolytic solution for non-aqueous secondary battery and non-aqueous secondary battery Shohei Kataoka 2021-02-16