Issued Patents 2020
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879069 | Method and apparatus for forming hard mask film and method for manufacturing semiconductor devices | — | 2020-12-29 |
| 10804078 | Plasma processing apparatus and gas introduction mechanism | Tomohito Komatsu, Taro Ikeda, Jun NAKAGOMI, Takeo Wakutsu | 2020-10-13 |
| 10557200 | Plasma processing device with shower plate having protrusion for suppressing film formation in gas holes of shower plate | Taro Ikeda, Shigeru Kasai, Emiko HARA, Yuki Osada, Jun NAKAGOMI +1 more | 2020-02-11 |