Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10840359 | Method of forming FinFET source/drain contact | — | 2020-11-17 |
| 10593556 | Method of fabricating semiconductor device, vacuum processing apparatus and substrate processing apparatus | Takashi Hayakawa, Hiroshi Okuno, Reiji Niino, Hiroyuki Hashimoto, Tatsuya Yamaguchi | 2020-03-17 |