Issued Patents 2020
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10872818 | Buried power rail and method forming same | Shi Ning Ju, Kuan-Lun Cheng, Chih-Hao Wang | 2020-12-22 |
| 10868186 | FinFETs with source/drain cladding | Ka-Hing Fung, Zhiqiang Wu | 2020-12-15 |
| 10868150 | Devices including gate spacer with gap or void and methods of forming the same | Ching-Wei Tsai, Chi-Wen Liu, Ying-Keung Leung | 2020-12-15 |
| 10867867 | Methods of fabricating semiconductor devices with mixed threshold voltages boundary isolation of multiple gates and structures formed thereby | Chung-Wei Hsu, Lung-Kun Chu, Jia-Ni Yu, Chih-Hao Wang, Mao-Lin Huang | 2020-12-15 |
| 10868015 | Hybrid scheme for improved performance for P-type and N-type FinFETs | Shi Ning Ju, Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2020-12-15 |
| 10868014 | Hybrid scheme for improved performance for P-type and N-type FinFETs | Shi Ning Ju, Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2020-12-15 |
| 10818777 | Method of manufacturing a semiconductor device and a semiconductor device | Chen-Feng Hsu, Chao-Ching Cheng, Tzu-Chiang Chen, Tung Ying Lee, Wei-Sheng Yun +1 more | 2020-10-27 |
| 10804162 | Dual channel gate all around transistor device and fabrication methods thereof | Chih-Hao Wang, Jui-Chien Huang, Chun-Hsiung Lin, Chih-Chao Chou, Pei-Hsun Wang | 2020-10-13 |
| 10763368 | Stacked gate-all-around FinFET and method forming the same | Chi-Wen Liu, Ying-Keung Leung | 2020-09-01 |
| 10755983 | Fin isolation structures of semiconductor devices | Chih-Hao Wang, Kuan-Lun Cheng, Yen-Ming Chen | 2020-08-25 |
| 10748775 | Semiconductor device structure with silicide and method for forming the same | Chun-Hsiung Lin, Jung-Hung Chang, Shih-Cheng Chen, Chih-Hao Wang | 2020-08-18 |
| 10727314 | FinFET with a semiconductor strip as a base | Shi Ning Ju, Ching-Wei Tsai, Chih-Hao Wang, Ying-Keung Leung, Carlos H. Diaz | 2020-07-28 |
| 10727301 | Semiconductor liner of semiconductor device | Chih-Hao Wang, Carlos H. Diaz | 2020-07-28 |
| 10707349 | FinFETs with source/drain cladding | Ka-Hing Fung, Zhiqiang Wu | 2020-07-07 |
| 10679900 | Fin spacer protected source and drain regions in FinFETs | Ting-Hung Hsu, Chao-Hsiung Wang, Chi-Wen Liu | 2020-06-09 |
| 10665718 | Wrap Around Silicide for FinFETs | Chi-Wen Liu, Ying-Keung Leung | 2020-05-26 |
| 10658247 | FinFET devices and methods of forming | Chi-Wen Liu | 2020-05-19 |
| 10622480 | Forming gate stacks of FinFETs through oxidation | Jiun-Jia Huang, Chao-Hsiung Wang, Chi-Wen Liu | 2020-04-14 |
| 10535656 | Hybrid scheme for improved performance for P-type and N-type FinFETs | Shi Ning Ju, Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang | 2020-01-14 |