FY

Fu-Kai Yang

TSMC: 13 patents #130 of 3,471Top 4%
Overall (2020): #5,401 of 565,922Top 1%
13
Patents 2020

Issued Patents 2020

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
10872781 Semiconductor device and a method for fabricating the same Chen-Ming Lee, Mei-Yun Wang 2020-12-22
10868118 Methods of forming epitaxial source/drain features in semiconductor devices Jia-Heng Wang, I-Wen Wu, Chen-Ming Lee, Mei-Yun Wang 2020-12-15
10867870 Semiconductor device with funnel shape spacer and methods of forming the same Cheng-Yu Yang, Yen-Ting Chen, Wei-Yang Lee, Yen-Ming Chen 2020-12-15
10867846 Fin field effect transistor (finFET) device structure with protection layer and method for forming the same Chien-Yuan Chen, Chen-Ming Lee, Mei-Yun Wang 2020-12-15
10854615 FinFET having non-merging epitaxially grown source/drains Chun Po Chang, Chen-Ming Lee, Mei-Yun Wang, Wei-Yang Lee, Tzu-Hsiang Hsu 2020-12-01
10825737 Prevention of contact bottom void in semiconductor fabrication Yun Lee, Chung-Ting Ko, Chen-Ming Lee, Mei-Yun Wang 2020-11-03
10797050 Fin field effect transistor (finFET) device structure with capping layer and method for forming the same Chun-Han Chen, Chen-Ming Lee, Mei-Yun Wang, Jr-Hung Li, Bo-Cyuan Lu 2020-10-06
10755945 Metal contacts on metal gates and methods thereof Pang-Sheng Chang, Yu-Feng Yin, Chao-Hsun Wang, Kuo-Yi Chao, Mei-Yun Wang +9 more 2020-08-25
10741438 Low-resistance contact plugs and method forming the same Shao-Ming Koh, Chen-Ming Lee 2020-08-11
10727068 Method for manufacturing semiconductor structure with mask structure Hsin-Ying Lin, Mei-Yun Wang, Hsien-Cheng Wang, Shih-Wen Liu, Hsiao-Chiu Hsu 2020-07-28
10685880 Methods for reducing contact depth variation in semiconductor fabrication Yun Lee, Chen-Ming Lee, Yi-Jyun Huang, Sheng-Hsiung Wang, Mei-Yun Wang 2020-06-16
10546755 Semiconductor device and a method for fabricating the same Chen-Ming Lee, Mei-Yun Wang 2020-01-28
10535555 Contact plugs and methods forming same Chao-Hsun Wang, Mei-Yun Wang, Kuo-Yi Chao 2020-01-14