Issued Patents 2020
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10872781 | Semiconductor device and a method for fabricating the same | Fu-Kai Yang, Mei-Yun Wang | 2020-12-22 |
| 10868118 | Methods of forming epitaxial source/drain features in semiconductor devices | Jia-Heng Wang, I-Wen Wu, Fu-Kai Yang, Mei-Yun Wang | 2020-12-15 |
| 10867846 | Fin field effect transistor (finFET) device structure with protection layer and method for forming the same | Chien-Yuan Chen, Fu-Kai Yang, Mei-Yun Wang | 2020-12-15 |
| 10854615 | FinFET having non-merging epitaxially grown source/drains | Chun Po Chang, Fu-Kai Yang, Mei-Yun Wang, Wei-Yang Lee, Tzu-Hsiang Hsu | 2020-12-01 |
| 10825737 | Prevention of contact bottom void in semiconductor fabrication | Yun Lee, Chung-Ting Ko, Mei-Yun Wang, Fu-Kai Yang | 2020-11-03 |
| 10797050 | Fin field effect transistor (finFET) device structure with capping layer and method for forming the same | Chun-Han Chen, Fu-Kai Yang, Mei-Yun Wang, Jr-Hung Li, Bo-Cyuan Lu | 2020-10-06 |
| 10741438 | Low-resistance contact plugs and method forming the same | Shao-Ming Koh, Fu-Kai Yang | 2020-08-11 |
| 10685880 | Methods for reducing contact depth variation in semiconductor fabrication | Yun Lee, Fu-Kai Yang, Yi-Jyun Huang, Sheng-Hsiung Wang, Mei-Yun Wang | 2020-06-16 |
| 10546755 | Semiconductor device and a method for fabricating the same | Fu-Kai Yang, Mei-Yun Wang | 2020-01-28 |