Issued Patents 2020
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10871711 | Resist composition and patterning process | Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara | 2020-12-22 |
| 10845439 | Magnetic resonance imaging apparatus using positional information based on an image obtained by reconstructing a magnetic resonance signal | Shinji Mitsui, Satoshi Imai, Miyuki Ota, Sadanori Tomiha | 2020-11-24 |
| 10591819 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Koji Hasegawa, Jun Hatakeyama, Kazuhiro Katayama | 2020-03-17 |
| 10527939 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Koji Hasegawa, Jun Hatakeyama, Kazuhiro Katayama | 2020-01-07 |