KT

Kwadwo E. Tettey

RH Rohm And Haas Electronic Materials Cmp Holdings: 4 patents #9 of 40Top 25%
📍 Newark, DE: #3 of 141 inventorsTop 3%
🗺 Delaware: #32 of 653 inventorsTop 5%
Overall (2020): #50,333 of 565,922Top 9%
4
Patents 2020

Issued Patents 2020

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
10822524 Aqueous compositions of low dishing silica particles for polysilicon polishing Naresh Kumar Penta, Matthew Van Hanehem, Koichi Yoshida, Kyohei Yoshida 2020-11-03
10787592 Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environment Naresh Kumar Penta, Matthew Van Hanehem 2020-09-29
10626298 Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous silicon Naresh Kumar Penta, Matthew Van Hanehem 2020-04-21
10584265 Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them Naresh Kumar Penta, Yi Guo, David Mosley, Matthew Van Hanehem 2020-03-10