Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10722999 | High removal rate chemical mechanical polishing pads and methods of making | Thomas P. Willumstad, Bainian Qian, Rui Xie, Kenjiro Ogata, Marty W. DeGroot | 2020-07-28 |
| 10569384 | Chemical mechanical polishing pad and polishing method | Matthew R. Gadinski, Mohammad T. Islam, Yi Guo | 2020-02-25 |