MI

Mohammad T. Islam

RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #19 of 40Top 50%
📍 Newark, DE: #33 of 141 inventorsTop 25%
🗺 Delaware: #206 of 653 inventorsTop 35%
Overall (2020): #338,585 of 565,922Top 60%
1
Patents 2020

Issued Patents 2020

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
10569384 Chemical mechanical polishing pad and polishing method Matthew R. Gadinski, Yi Guo, George C. Jacob 2020-02-25