Issued Patents 2020
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10875144 | Chemical mechanical polishing pad | Fengji Yeh, Te-Chun Wang, Sheng-Huan Tseng, Kevin Wen-Huan Tung, Marty W. DeGroot | 2020-12-29 |
| 10722999 | High removal rate chemical mechanical polishing pads and methods of making | Thomas P. Willumstad, Rui Xie, Kenjiro Ogata, George C. Jacob, Marty W. DeGroot | 2020-07-28 |
| 10625393 | Chemical mechanical polishing pads having offset circumferential grooves for improved removal rate and polishing uniformity | Teresa Brugarolas Brufau, Julia Kozhukh | 2020-04-21 |