JW

Jiun-Fang Wang

RH Rohm And Haas Electronic Materials Cmp Holdings: 2 patents #14 of 40Top 35%
📍 Hsinchu, NJ: #12 of 26 inventorsTop 50%
Overall (2020): #159,953 of 565,922Top 30%
2
Patents 2020

Issued Patents 2020

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10573524 Method of chemical mechanical polishing a semiconductor substrate Wei-Wen Tsai, Cheng-Ping Lee 2020-02-25
10557060 Method of chemical mechanical polishing a substrate Lin-Chen Ho, Wei-Wen Tsai, Cheng-Ping Lee 2020-02-11