Issued Patents 2020
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10745372 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | Takumi TOIDA, Takashi Sato, Takashi MAKINOSHIMA | 2020-08-18 |
| 10747112 | Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method | Takumi TOIDA, Takashi MAKINOSHIMA | 2020-08-18 |
| 10723690 | (Meth)acryloyl compound and method for producing same | — | 2020-07-28 |
| 10642156 | Resist base material, resist composition and method for forming resist pattern | Takumi TOIDA, Takashi Sato, Youko Shimizu | 2020-05-05 |
| 10577323 | Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying compound or resin | Kana OKADA, Junya HORIUCHI, Takashi MAKINOSHIMA | 2020-03-03 |
| 10550068 | Compound and method for producing same | — | 2020-02-04 |