JH

Junya HORIUCHI

MC Mitsubishi Gas Chemical Company: 1 patents #52 of 165Top 35%
Overall (2020): #403,063 of 565,922Top 75%
1
Patents 2020

Issued Patents 2020

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
10577323 Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying compound or resin Kana OKADA, Takashi MAKINOSHIMA, Masatoshi Echigo 2020-03-03