Issued Patents 2020
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10745372 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | Masatoshi Echigo, Takashi Sato, Takashi MAKINOSHIMA | 2020-08-18 |
| 10747112 | Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method | Masatoshi Echigo, Takashi MAKINOSHIMA | 2020-08-18 |
| 10642156 | Resist base material, resist composition and method for forming resist pattern | Masatoshi Echigo, Takashi Sato, Youko Shimizu | 2020-05-05 |