Issued Patents 2020
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10722999 | High removal rate chemical mechanical polishing pads and methods of making | Bainian Qian, Rui Xie, Kenjiro Ogata, George C. Jacob, Marty W. DeGroot | 2020-07-28 |
TW
Thomas P. Willumstad
Nitta Haas: 1 patents #1 of 13Top 8%
Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #19 of 40Top 50%
Overall (2020): #246,100 of 565,922Top 45%
1
Patents 2020