Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10875144 | Chemical mechanical polishing pad | Bainian Qian, Fengji Yeh, Te-Chun Wang, Sheng-Huan Tseng, Kevin Wen-Huan Tung | 2020-12-29 |
| 10722999 | High removal rate chemical mechanical polishing pads and methods of making | Thomas P. Willumstad, Bainian Qian, Rui Xie, Kenjiro Ogata, George C. Jacob | 2020-07-28 |