Issued Patents 2020
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10722999 | High removal rate chemical mechanical polishing pads and methods of making | Thomas P. Willumstad, Bainian Qian, Rui Xie, George C. Jacob, Marty W. DeGroot | 2020-07-28 |