Issued Patents 2020
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10825811 | Gate cut first isolation formation with contact forming process mask protection | Xiaoming Yang, Sipeng Gu, Jeffrey Chee | 2020-11-03 |
| 10741554 | Third type of metal gate stack for CMOS devices | Ramachandra Divakaruni, Sameer H. Jain, Viraj Y. Sardesai | 2020-08-11 |
| 10734233 | FinFET with high-k spacer and self-aligned contact capping layer | Hui Zang, Guowei Xu | 2020-08-04 |
| 10635007 | Apparatus and method for aligning integrated circuit layers using multiple grating materials | Dongyue Yang, Guanchen He, Xintuo Dai, Xueli Hao | 2020-04-28 |
| 10615279 | FinFET with dielectric isolation after gate module for improved source and drain region epitaxial growth | Eric C. Harley, Judson R. Holt, Yue Ke, Rishikesh Krishnan, Henry K. Utomo | 2020-04-07 |
| 10580875 | Middle of line structures | Hui Zang, Guowei Xu, Viraj Sardesai | 2020-03-03 |