RC

Renzo Capelli

CG Carl Zeiss Smt Gmbh: 2 patents #22 of 200Top 15%
📍 Heidenheim, DE: #4 of 38 inventorsTop 15%
Overall (2020): #129,744 of 565,922Top 25%
2
Patents 2020

Issued Patents 2020

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10775691 Method for examining photolithographic masks and mask metrology apparatus for performing the method Dirk Hellweg, Markus Koch 2020-09-15
10564551 Method for determining a focus position of a lithography mask and metrology system for carrying out such a method Markus Koch, Dirk Hellweg, Martin Dietzel 2020-02-18