Issued Patents 2020
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10738219 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more | 2020-08-11 |
| 10647900 | Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors | Martin Kaller, Michael Lauter, Yuzhuo Li, Andreas Klipp | 2020-05-12 |
| 10570316 | Chemical mechanical polishing (CMP) composition | Max Siebert, Yongqing Lan, Michael Lauter, Haci Osman GUEVENC, Julian Proelss +2 more | 2020-02-25 |