Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10738219 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more | 2020-08-11 |
| 10570316 | Chemical mechanical polishing (CMP) composition | Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Haci Osman GUEVENC +2 more | 2020-02-25 |