| 10865361 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Michael Lauter, Leonardus Leunissen, Ivan Garcia Romero +3 more |
2020-12-15 |
| 10844325 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Michael Lauter, Peter Przybylski, Andreas Klipp +4 more |
2020-11-24 |
| 10844333 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Michael Lauter, Piotr Przybylski, Andreas Klipp +4 more |
2020-11-24 |
| 10738219 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Sheik Ansar Usman Ibrahim +3 more |
2020-08-11 |
| 10570316 |
Chemical mechanical polishing (CMP) composition |
Robert REICHARDT, Max Siebert, Yongqing Lan, Michael Lauter, Haci Osman GUEVENC +2 more |
2020-02-25 |
