Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10319905 | Method and system for performing post-etch annealing of a workpiece | David Hurley, Doni Parnell, Toru Ishii | 2019-06-11 |
| 10236162 | Method of etching porous film | Eiichi Nishimura, Mikhail Baklanov, Liping Zhang, Jean-Francois de Marneffe | 2019-03-19 |
| 10229815 | Plasma etching apparatus and method | Akira Koshiishi, Noriyuki Kobayashi, Shigeru Yoneda, Kenichi Hanawa, Masaru Sugimoto | 2019-03-12 |