Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10497575 | Method for increasing trench CD in EUV patterning without increasing single line opens or roughness | Jeffrey Shearer | 2019-12-03 |
| 10453686 | In-situ spacer reshaping for self-aligned multi-patterning methods and systems | Eric Chih-Fang Liu, Akiteru Ko | 2019-10-22 |
| 10354873 | Organic mandrel protection process | Akiteru Ko, Sophie Thibaut, Satoru Nakamura, Nihar Mohanty | 2019-07-16 |